Ti-Al targets

Titanium Aluminum Sputtering Target

Titanium Aluminum Planar (Rectangle, Circular) Sputtering Target
Titanium Aluminum Rotatable (Rotary, Cylindrical) Sputtering Target

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CXMET equipped with a professional factory is one of the leading manufacturers and suppliers for various materials and sizes of sputtering targets. Our TiAl sputtering target, with high purity, include bonding or spayed (straight or dogbone) rotatable (rotary, cylindrical) targets, planar (rectangle, disc) targets, which are extensively used in PVD coating for thin film deposition technology. Welcome to buy and wholesale our low price, high usage rates, high purity, and high-quality TiAl targets.

High feed speeds, excellent cutting performance, and impressive metal removal rates: not a problem for titanium-aluminum-based coatings. A coating of just one-thousandth of a millimeter of our materials reliably protects your tools against wear and therefore extends their service life. Ti-Al targets and cathodes are also used for decorative coatings on electronic devices such as cellular phones, on spectacle frames, or on the dials of luxury watches.

Our materials are applied using either the reactive magnetron sputtering method or arc evaporation and form in a nitrogen atmosphere a nitride hard material layer on the substrate.

 

Our Ti-Al targets are popular due to their:

1. High ductility

2. High thermal conductivity

3. Homogeneous microstructure

4. An unbeatable level of material purity

Whatever the geometry – rotary or planar arc cathodes or planar sputtering targets: We can supply tailor-made targets that are perfect for your application.

Titanium Aluminum Rotatable (Rotary, Cylindrical) Sputtering Target

Manufacturing Range:

OD (mm) ID (mm) Length (mm) Custom Made
80 – 160 60 – 125 100 – 4000

Specification

Composition [at%] 25/75, 30/70, 33/67, 40/60, 50/50

60/40, 67/33, 70/30, 75/25, 80/20

Purity 99.7%
Density 3.1 – 4.0 g/cm3
Grain Sizes < 100 micron or on request
Fabrication Processes HIP, Plasma Spraying, Machining, Bonding
Shape Straight, Dogbone
End Types SCI, SRF, DSF, RFF, WFF, VA, GPI Ends Fixation, Spiral Groove, Custom Made for SS Backing Tube
Surface Ra 1.6 micron

Titanium Aluminum Planar (rectangle, circular) Sputtering Target

Manufacturing Range

Rectangle Length (mm) Width (mm) Thickness(mm)  

Custom Made

10 – 2000 10 – 400 5.0 – 40
Circular Diameter (mm) Thickness (mm)
5.0 – 500 5.0 – 40

Specification

Composition [at%] 25/75, 30/70, 33/67, 40/60, 50/50

60/40, 67/33, 70/30, 75/25, 80/20

Purity 99.7%
Density 3.1 – 4.0 g/cm3
Grain Sizes < 100 micron or on request
Fabrication Processes HIP, Machining, Bonding
Shape Monolithic, Multi-segmented Target, Bonding
End Type Plate, Disc, Step, Down bolting, Threading, Custom Made
Surface Ra 1.6 micron

 

Titanium Aluminum arc cathodes

We supply rotary and planar arc cathodes as well as rotary and planar sputtering targets

For our Titanium Aluminum Sputtering Targets and arc cathodes

Impurities Content [wt%]

Titanium/aluminum Content [at%] 30/70 33/67 50/50 60/40 70/30
Purity [%] 99.7 99.7 99.7 99.7 99.7
Metallic Impurities [μg/g] Ti 32.77 46.30 63.7 72.49 78.15
Al 67.20 53.20 35.9 27.13 20.98
Cu 0.002 0.002 0.002 0.002 0.002
Mn 0.01 0.008 0.004 0.004 0.004
Mg 0.03 0.03 0.03 0.03 0.03
Fe 0.12 0.12 0.085 0.085 0.085
Si 0.06 0.06 0.075 0.075 0.061
Non-Metallic Impurities [μg/g] O 0.09 0.09 0.09 0.09 0.09
N 0.003 0.003 0.003 0.003 0.002
C 0.015 0.015 0.015 0.015 0.015
Cl 0.013 0.013 0.013 0.013 0.013
Guaranteed Density [g/cm3] 3.24 3.260 3.61 3.79 3.99
Grain Size [μm] 100 100 100 100 100
Thermal Conductivity [W/(m·K)] 110 102 61 48 41
Coefficient of Thermal Expansion [1/K] 20. 18. 16. 15. 14.

 

Typical Composition (at%) of Titanium Aluminum (Ti-Al) Alloy Sputtering Targets

Ti33Al67, Ti50Al50, and Ti70Al30.

 

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