Ti-Al targets-Ti70Al30

CXMET equipped with a professional factory is one of the leading manufacturers and suppliers for various materials and sizes of sputtering targets. Our TiAl sputtering target, with high purity, include bonding or spayed (straight or dogbone) rotatable (rotary, cylindrical) targets, planar (rectangle, disc) targets, which are extensively used in PVD coating for thin film deposition technology. Welcome to buy and wholesale our low price, high usage rates, high purity, and high-quality TiAl targets.

Purity: 99.8%

Density: >=3.95 g/cm3

Grain Size: <100um

Thermal conductivity: 40 W/m.K

Size:

Planar Sputtering Targets: <=1500x500mm

Rotary Sputtering Targets: Length<=2000mm, thickness<=15mm (Integral forming by HIP)

If you want to know more parameters of our Ti-Al target, please click here.

Typical Composition (at%) of Titanium Aluminum (Ti-Al) Alloy Sputtering Targets：

Ti33Al67, Ti50Al50, and Ti70Al30.

High feed speeds, excellent cutting performance, and impressive metal removal rates: not a problem for titanium-aluminum-based coatings. A coating of just one-thousandth of a millimeter of our materials reliably protects your tools against wear and therefore extends their service life. Ti-Al targets and cathodes are also used for decorative coatings on electronic devices such as cellular phones, on spectacle frames, or on the dials of luxury watches.

Our materials are applied using either the reactive magnetron sputtering method or arc evaporation and form in a nitrogen atmosphere a nitride hard material layer on the substrate.

Our Ti-Al targets are popular due to their:

1. High ductility

2. High thermal conductivity

3. Homogeneous microstructure

4. An unbeatable level of material purity

Whatever the geometry – rotary or planar arc cathodes or planar sputtering targets: We can supply tailor-made targets that are perfect for your application.