Tubular, Rotary, Rotatable Sputtering Targets

Monolithic Rotatable (Rotary, Cylindrical) Sputtering Target

Material: Titanium, Zirconium, Nickel, Chromium, Niobium, Tantalum, Vanadium, Aluminum, Silicon


CXMETTECH’s sputtering target and arc cathodes with particularly homogeneous microstructure and outstanding surface quality are mainly used for metallization in thin-film transistors for TFT-LCD monitors, television sets, cell phone displays and CD.

We offer rotary sputtering target as follows( click the links to check the detailed information for each material):


Titanium Rotary Sputtering Target

Zirconium Rotary Sputtering Target

Chromium Rotary Sputtering Target

Niobium Rotary Sputtering Target

Tantalum Rotary Sputtering Target

Vanadium Rotary Sputtering Target

Aluminum Rotary Sputtering Target

Silicon Rotary Sputtering Target

CXMET as a top class manufacturer for Titanium and Titanium alloys over 15 years, many companies turn to CXMET for Titanium and Titanium alloys because they consider us the most reliable vendor they trust to provide high quality titanium products that meet or exceed their specifications.

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