Planar titanium sputtering targets have high purity & density and uniform microstructure. Therefore, the Planar titanium sputtering target can be perfectly applied in depositing thin films in TFT displays and other related industries.
Rectangle targets are made of Titanium Rolled Plates, According to ASTM B265
For rectangle targets, we cut big plates into sizes by water jet, to make sure the composition, mechanical properties and the grain structure of every part in the same batch are homogeneous and consistent. We can supply the layout of the master plate, our customer can trace the position of every part by our marking system.
Circular Targets usually are made of Rolled bars (ASTM B348)
For the circular targets, we cut long bars into sizes by wire-electrode cutting, to make sure the composition, mechanical properties and the grain structure of every part in the same batch are homogeneous and consistent, we can supply the layout of the master bar, our customer can trace the position of every part by our marking system.
We supply rotary and planar arc cathodes as well as rotary and planar sputtering targets
Rectangle | Length(mm) | Width (mm) | Thickness(mm) | Custom Made |
10 – 2000 | 10 – 1200 | 1.0 – 50.8 | ||
Circular | Diameter (mm) | Thickness (mm) | ||
10 – 1000 | 1.0 – 100 |
Specification
Composition | Grade 1 Grade 2 Ti6Al4V Grade 5 |
Purity | CP Grade2 (99.5%), 3N (99.9%), 3.5N (99.95%), 4N (99.99%), 4.5N (99.995%), 5N (99.999%) |
Density | 4.51 g/cm3 |
Grain Sizes | < 50 micron or on request |
Shape | Plate, Disc, Step, Down bolting, Threading, Custom Made |
Type | Monolithic, Multi-segmented Target, Bonding |
Surface | Ra 1.6 micron |
Fabrication Processes | Vacuum Melting, Forging, Rolling, Machining |