Titanium Targets-Titanium Planar Sputtering Target

Titanium Planar (Rectangle, Circular) Sputtering Target

Planar titanium sputtering targets have high purity & density and uniform microstructure. Therefore, the Planar titanium sputtering target can be perfectly applied in depositing thin films in TFT displays and other related industries.

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Rectangle target

Rectangle targets are made of Titanium Rolled Plates,  According to ASTM B265

For rectangle targets, we cut big plates into sizes by water jet, to make sure the composition, mechanical properties and the grain structure of every part in the same batch are homogeneous and consistent. We can supply the layout of the master plate, our customer can trace the position of every part by our marking system.

Circular Target

Circular Targets usually are made of Rolled bars (ASTM B348)

For the circular targets, we cut long bars into sizes by wire-electrode cutting, to make sure the composition, mechanical properties and the grain structure of every part in the same batch are homogeneous and consistent, we can supply the layout of the master bar, our customer can trace the position of every part by our marking system.

Note: Titanium Arc Cathodes

We supply rotary and planar arc cathodes as well as rotary and planar sputtering targets

 

Manufacturing Range of CXMETTECH’s Titanium Planar Sputtering Target

 

Rectangle Length(mm) Width (mm) Thickness(mm) Custom Made
10 – 2000 10 – 1200 1.0 – 50.8
Circular Diameter (mm) Thickness (mm)
10 – 1000 1.0 – 100

 

Specification

Composition Grade 1  Grade 2  Ti6Al4V  Grade 5
Purity CP Grade2 (99.5%), 3N (99.9%), 3.5N (99.95%), 4N (99.99%),  4.5N (99.995%),  5N (99.999%)
Density 4.51 g/cm3
Grain Sizes < 50 micron or on request
Shape Plate, Disc, Step, Down bolting, Threading, Custom Made
Type Monolithic, Multi-segmented Target, Bonding
Surface Ra 1.6 micron
Fabrication Processes Vacuum Melting, Forging, Rolling, Machining

 

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