Aluminum Sputtering Target

Aluminum Sputtering Target

Aluminum Planar (Rectangle, Circular) Sputtering Target
Aluminum Rotatable (Rotary, Cylindrical) Sputtering Target

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Aluminum Sputtering Target Description

The aluminum sputtering target has the same properties as metal aluminum. Aluminum is a silvery-white, soft, non-magnetic, and ductile metal in the boron group. By mass, aluminum makes up about 8% of the Earth’s crust; it is the third most abundant element after oxygen and silicon and the most abundant metal in the crust, though it is less common in the mantle below. The chief ore of aluminum is bauxite. Aluminum metal is highly reactive, such that native specimens are rare and limited to extreme reducing environments. Instead, it is found combined in over 270 different minerals. When evaporated in a vacuum, aluminum layers form a reflective coating found on telescopes, automotive headlamps, mirrors, packages, and toys. The aluminum sputter target is widely used in the aerospace, automotive lighting, OLED, and optical industries.

Aluminum Sputtering Target Specification

Material Type Aluminum
Symbol Al
Color/Appearance Silvery, Metallic
Melting Point 660.37°C
Boiling Point 2467 °C
Density 2.7 g/cm3
Fabrication Processes Vacuum Melting, Machining
Purity 3N (99.9%), 3N5 (99.95%), 4N (99.99%), 4N5 (99.995%), 5N (99.999%)
Surface Ra 1.6 micron
Shape Planar (Rectangle, Circular)  Rotatable (Rotary, Cylindrical)

Aluminum Rotatable (Rotary, Cylindrical) Sputtering Target Manufacturing Range

OD (mm) ID (mm) Length (mm) Custom Made
80 – 250 60 – 230 100 – 4000

Aluminum Planar (Rectangle, Circular) Sputtering Target Manufacturing Range

Rectangle Length (mm) Width (mm) Thickness (mm) Custom Made
10 – 2000 10 – 600 2.0 – 40
Circular Diameter (mm)   Thickness (mm)
5.0 – 500   2.0 – 40

Application

Aluminum has good thermal properties and is malleable and ductile. Aluminum and its alloys are widely used for various applications including aircraft assemblies and engine parts. The aluminum sputtering target is used for thin film deposition, typically for fuel cell, decoration, semiconductor, display, LED and photovoltaic devices, glass coating, etc.

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